Abstract: Titanium Aluminum Nitride (Ti-Al-N) system is a well established hard coating known for their good physical, chemical and mechanical properties that is used in a variety of fields. The aim of this research is to investigate the influence of bias voltage and aluminum content on the microstructure, chemical composition and the residual stress of Ti-Al-N in order to illuminate the possibility of tailoring the coating properties mentioned above. Four groups of Ti_1-xAl_xN coatings were deposited by Cathodic Arc Evaporation (CAE) using powder metallurgical targets of Ti_1-xTAl_xT with x_T = 0.50, 0.55, 0.60 and 0.66. The coatings were deposited onto cemented carbide (WC-Co) substrates at a temperature of 500°C, at different bias voltages: -25, -50 and -100 V. Structural characterization of the coatings was performed with Glancing Angle X-Ray Diffraction (GAXRD) and Glow Discharge Optical Emission Spectroscopy (GDOES). The microstructure of the coatings changed from predominantly single-phase fcc for x between ~0.50 and ~0.60 to dual phase fcc+hcp for x = ~0.66. The residual stress and the stress-free lattice parameter were analyzed using GAXRD and the sin²Ψ method was used to evaluate the data. Young’s modulus of 500 GPa and Poisson’s ratio of 0.3 were utilized in the evaluation. Residual compressive stress increased for about 4 GPa with increasing bias from -25 to -50 V. Further increasing bias from -50 to -100 V resulted only in an increase of about 1GPa. This investigation shows clearly the relations between the target and coating composition where bias is an important parameter.