Journal of Engineering and Applied Sciences

Year: 2019
Volume: 14
Issue: 7 SI
Page No. 9917 - 9922

Preparation of Manganese Sulfide Thin Film by Thermal Evaporation Technique Deposition: Application of the Experimental Design Photodiode

Authors : Mazin H. Hasan, Fuad T. Ibrahim and Huda N. Abed

Abstract: Manganese Sulfide (MnS) thin films were prepared by thermal evaporation technique which deposited on a glass and silicon substrate. The deposited films were examined for their morphology and crystal structure by X-Ray Diffraction (XRD). The MnS heterojunction was successfully fabricated by using thermal evaporation technique at different temperature. The I-V properties of the heterogeneous MnS depend heavily on the structure. Silicon improves performance MnS shows good transparency in the spectral range 300-900 nm and the electrical properties of the system are highly dependent on the structure. The maximum value of the R (λ) spectral response of the MnS detection amplifier is 0.165 A/W at 450±50 nm. The maximum detection value of D (λ) was found around 2.359×1012 (cm Hz-1/W) at 450±60 nm wavelength of the MnS optical amplifier.

How to cite this article:

Mazin H. Hasan, Fuad T. Ibrahim and Huda N. Abed, 2019. Preparation of Manganese Sulfide Thin Film by Thermal Evaporation Technique Deposition: Application of the Experimental Design Photodiode. Journal of Engineering and Applied Sciences, 14: 9917-9922.

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